Trade Mark Journal No.2024/040 4 October 2024

WO0000001796277 (7,9,11,40,42)

Office of origin: United States of America

Date of International Registration:25 October 2023
Date of designation in the UK: 25 October 2023
Image for mark 1796277 QXP+

International priority date claimed: 27 April 2023 (United States of America) (97911161)
Class 7
Machines for semiconductor processing / manufacturing; machines for thin film deposition; semiconductor chip manufacturing equipment, namely, semiconductor chip manufacturing machines; semiconductor wafer processing equipment; semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; machines for the production of semiconductors; robots, vacuum systems, motors and engines, drive units, parts of semiconductor manufacturing machines and control mechanisms for operating semiconductor manufacturing machines; injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; industrial cleaning apparatus using air to assist in the cleaning of components in the semiconductor industry; metal organic vapor deposition equipment, namely, vapor deposition apparatus for semiconductor processing machines, and chemical vapor deposition apparatus for use in manufacturing semiconductors; apparatus for processing and manufacturing semiconductors or for thin film deposition.
Class 9
Recorded computer software for semiconductor processing or for thin film deposition; semiconductor testing apparatus; computer software for use in processing semiconductor wafers; electronic semiconductor control, checking and measuring devices, namely, computer hardware and recorded computer software for use in measuring, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; semiconductors; downloadable computer control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; downloadable computer operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces.
Class 11
Industrial drying apparatus using air for drying components in the semiconductor industry; industrial drying apparatus using air to assist in the cleaning of components in the semiconductor industry.
Class 40
Processing of semiconductors or deposition of thin films on substrates; consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (cvd), plasma enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films onto surfaces.
Class 42
Research and development services for semiconductor processing or deposition of thin films on substrates; scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (cvd), plasma-enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films, in particular in relation to the operation of machines and installations for cvd, pecvd, ald and avd of thin films onto surfaces; industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (cvd), plasma-enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (cvd), plasma-enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films onto surfaces; design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (cvd), plasma-enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films onto surfaces; technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (cvd), plasma enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (cvd), plasma enhanced chemical vapor deposition (pecvd), atomic layer deposition (ald) or atomic vapor deposition (avd) of thin films.

Eugenus, Inc.

Representative: Wiggin LLP, Jessop House, Jessop Avenue, Cheltenham Gloucestershire GL50 3WG UNITED KINGDOM